Journal of the Chilean Chemical Society
versión On-line ISSN 0717-9707
BUONO-CORE, G.E. et al. PHOTOCHEMICAL DEPOSITION OF Pd-LOADED AND Pt-LOADED TIN OXIDE THIN FILMS. J. Chil. Chem. Soc. [online]. 2006, vol.51, n.3, pp. 950-956. ISSN 0717-9707. http://dx.doi.org/10.4067/S0717-97072006000300004.
Pd and Pt loaded tin OXide thin films have been successfully prepared by direct UV irradiation of amorphous films of ß-diketonate complexes on Si(100) substrates. Tin OXide films loaded with 10, 30 and 50% Pd and Pt, were characterized by Auger electron spectroscopy (AES). The Auger peak intensity ratios of O KL23L23 to Sn M4N45N45 showed that as-deposited films consist of mixed tin OXide phases whereas annealed films consist mainly of single phase SnO2. The results showed that the stoichiometry of the resulting films is in relative agreement with the composition of the precursor films. The surface characterization of these thin films was performed using Atomic Force Microscopy (AFM). This analysis revealed that loaded tin OXide films have a much rougher surface than unloaded films, with rms roughness values ranging from 28-54 nm for as-deposited Pd-SnOX films to 3.6-20 nm for as-deposited Pt-SnOX films. It was also found that Pt-loaded tin OXide films present a better particle size distribution and uniformity when compared to Pd-loaded tin OXide films. These results demonstrate the potential use of these deposited films in the manufacture of gas-sensing devices
Palabras llave : Tin OXide; Platinum; Palladium; photodeposition; thin films.